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Title Handbook of photomask manufacturing technology / edited by Syed Rizvi.
Imprint Boca Raton [Fla.] : Taylor & Francis, 2005.


 Internet  Electronic Book    AVAILABLE
Description 1 online resource (xxiii, 704 pages) : illustrations
Bibliog. Includes bibliographical references and index.
Note Available only to authorized UTEP users.
Subject Masks (Electronics) -- Handbooks, manuals, etc.
Genre Handbooks and manuals.
Electronic book.
Contents Foreword by Yoshio Nishi; Preface, Syed Rizvi; INTRODUCTION; Introduction to Mask Making; A.G. Zanzal; MASK WRITING; Data Preparation; P.J.M. van Adrichem and C.K. Kalus; Mask Writers: An Overview; S. Babin; E-Beam Mask Writers; N. Saitou; Laser Mask Writers; C. Rydberg; OPTICAL MASKS; Optical masks: An Overview; N. Yoshioka; Conventional Optical Masks; S.A. Rizvi; Advanced Optical Masks; W. Maurer and F. Schellenberg; NGL MASKS; NGL Masks: An Overview; K.R. Kimmel and M. Lercel; Masks for Electron Beam Projection Lithography; H. Sano, S. Palmer, and M. Yamabe; Masks for Extreme Ultraviolet Lithography; P-Y. Yan; Masks for Ion Projection Lithography; S.A. Rizvi, F-M. Kamm, J. Butschke, F. Letzkus, and H. Loeschner; Mask for Proximity X-Ray Lithography; M. Oda and H. Yoshihara; MASK PROCESSING, MATERIALS, AND PELLICLES; Mask Substrate; S.A. Rizvi; Resists for Mask Making; B. Rathsack, D. Medeiros, and C.G. Wilson; Resist Charging and Heating; M. Bai, D. Chu, and F. Pease; Mask Processing; S.A. Rizvi; Mask Materials: Optical Properties; V. Liberman; Pellicles; T. Yen, C.B. Wang, and R. Heuser; MASK METROLOGY, INSPECTION, EVALUATION, AND REPAIRS; Photomask Feature Metrology; J. Potzick; Optical Critical Dimension Metrology; R.J. Hoobler; Photomask Critical Dimension Metrology in the Scanning Electron Microscope; M.T. Postek; Geometrical Characterization of Mask Using SPM; S. Muckenhirn and A. Meyyappan; Metrology of Image Placement; M.T. Takac; Optical Thin Film Metrology for Photomask Applications; E. Apak; Phase Measurement Tool for PSM; H. Kusunose; Mask Inspection: Theories and Principle; A. Rosenbusch and S. Hemar; Tool for Inspecting Masks: Lasertec MD 2500; M. Yonezawa and T. Matsuyama; Tool for Mask Image Evaluation; A. Zibold; Mask Repairs; R. Lee; MODELING AND SIMULATION; Modeling and Simulation; A. Erdmann; INDEX
Summary "The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.".
"Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies."--BOOK JACKET.
Other Author Rizvi, Syed.
Other Title Print version: Handbook of photomask manufacturing technology. Boca Raton [Fla.] : Taylor & Francis, 2005 0824753747